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  • CMP Orbis柜式化學機械研磨拋光設備
    CMP Orbis 柜式化學機械研磨拋光設備,The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum ....
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    更新日期

    2026-04-03
    02

    瀏覽量

    7649
  • CMP Tribo臺式化學機械研磨拋光設備
    CMP Tribo 臺式化學機械研磨拋光設備,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions.
    01

    更新日期

    2026-04-03
    02

    瀏覽量

    9889
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