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  • CMP Orbis柜式化學機械研磨拋光設備
    CMP Orbis 柜式化學機械研磨拋光設備,The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum ....
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    更新日期

    2026-04-03
    02

    瀏覽量

    7649
  • CMP Tribo臺式化學機械研磨拋光設備
    CMP Tribo 臺式化學機械研磨拋光設備,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions.
    01

    更新日期

    2026-04-03
    02

    瀏覽量

    9888
  • DP系列封閉式精密拋光系統
    The Logitech DP high speed polishing systems have been designed for semi automated ?nal stage polishing of hard materials, such as sapphire, silicon carbide or gallium nitride, to epitaxy ready qualit
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    更新日期

    2025-12-05
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    瀏覽量

    4677
  • DL系列封閉式精密研磨系統
    The Logitech DL precision lapping systems process materials with high geometric precision. These systems can process up to 4, 200mm/8” Ø samples (or multiple smaller samples) simultaneously.
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    更新日期

    2025-12-05
    02

    瀏覽量

    5546
  • WSB自動粘片機
    The Logitech WSB unit offer premium bonding for the processing of fragile semiconductor wafers such as Silicon and Gallium Arsenide.
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    更新日期

    2026-03-31
    02

    瀏覽量

    8749
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